Available to watch now, IUVSTA, in partnership with Ionautics, Hiden Analytical and Agilent Vacuum Products explore thin film deposition using Bipolar High-Power Impulse Magnetron Sputtering Want to ...
The confocal sputtering technique involves the arrangement of magnetrons inside a vacuum chamber so that it is possible to apply multiple materials onto the substrate without breaking vacuum. This ...
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Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...
Dublin, July 15, 2025 (GLOBE NEWSWIRE) -- The "Magnetron Sputter Film Market Outlook 2025-2034: Market Share, and Growth Analysis By Product Type (Metal Films, Alloy Films, Dielectric Films), By ...
Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...
The planar magnetron is a typical diode mode sputtering cathode consisting of a permanent magnet array behind it. This magnet array is organized in such a fashion to provide a magnetic field that is ...