Multi-beam mask writing was identified as one of the ways to eliminate hurdles to manufacturing curvilinear mask shapes in the last installment of this blog. Our blog series continues with an ...

Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...

In a new study, researchers used principal component analysis along with fluid dynamics simulation models to show the crucial importance of proper fit for all types of masks and how face shape ...